Dedicated Electron Beam Lithography

dedicated-electron-beam-lithography

Dedicated Electron Beam Lithography

Dedicated Electron Beam Lithography systems fulfill the automation and throughput requirements of industrial clients and centers of excellence offering nano-lithography services.

Products provided by Scitek Australia as listed described below:

EBPG5200

The EBPG5200 is a high perfromance nanolithography system with full 200mm writing capabilities. This technology presents a further evolutionary stage of the highly successful and field-proven EBPG series. Offering a range of leading edge solutions for both direct write nanolithography and R&D.

  • High current density Thermal Field Emission gun for operation at 20, 50 and 100kV
  • 200 mm platform for up to 8 inch wafer and 7 inch masks
  • Minimum feature size of less than 8 nm
  • Continuously variable large field size operation to 1 mm at all kVs
  • GUI for ease of use operation for diverse “multi user environment”
  • Flexible configuration packages to ensure best fit with application requirements

EBPG5000

EBPG5000 Plus

This system is an evolution of the highly successful, field proven EBPG4 and 5 systems. The EBPG5000 Plus has established itself worldwide for advanced nanolithography applications, particularly in direct writing of both R&D and production GaAs devices.

  • High current density Thermal Field Emission gun for operation at 20, 50 and 100kV
  • 200 mm platform for up to 8 inch wafer and 7 inch masks
  • Minimum feature size of less than 8 nm
  • Rapid Exposure with 25 or 50 MHz pattern generator
  • Flexible configuration packages to ensure best fit with application requirements

EBPG5000 Plus

Voyager

This system is recommended for all industrial and academic Electron Beam Lithography applications where the important objectives are high write throughput and maximum resolution. Along with having an innovative eWRITE system architecture, it comes with it an attractive and economical price/performance ratio for the lifetime of the system. It allows for samples up to 8 inches to be exposed at high speed, necessary system stability is ensured, even in difficult environments, by a thermally stabilized and environmentally tolerant housing.

  • Reliable speed for first design to finish sample
  • Smart design, enclosed environment and small system footprint
  • Innovative and future safe system architecture
  • Excellent cost of ownership for dedicated Electron Beam Lithography writing with a speed of more than 1 cm/h

Voyager - Raith

Raith150 Two

Since its introduction, this system has established itself as a bestseller among universal, high resolution Electron Beam Lithography Systems. Providing a robustness in 24/7 use and its performance in both research and nanotechnology centers worldwide. Capable of exposing structures less than 5nm and world with sample sizes from mm – 8 inch wafers, it can be used in demanding situations given both thermal stability and environmentally tolerant shielding.

  • Sub 8 nm Lithography
  • low  kV exposure and imaging
  • System Automation
  • Sample handling up to 8 inches
  • Split room setup/thermo stabilization

Raith150 Two

For more information on these or any of our range contact us on contact@scitek.com.au