SENresearch: Spectroscopic ellipsometer family
The high end SENresearch is designed for spectroscopic ellipsometry in the widest spectral range from 190 nm (deep UV) to 3,500 nm (NIR). Using the Step Scan Analyzer principle, the SENresearch measures thin film thickness, refractive index, extinction coefficient, and related properties of bulk materials, single layers, and multi layer stacks. The SENresearch is adapted to anisotropy, generalized ellipsometry, Mueller Matrix, and scatterometry. Download PDF
SENpro: Cost-effective spectroscopic ellipsometry
The SENpro ellipsometer is the smart solution to spectroscopic ellipsometry applications. It features a goniometer with angles of incidence in 5 °-steps. Easy operation, rapid measurement, and intuitive data analysis are combined in a cost-effective design for measuring thickness and optical constants of single films and multilayer stacks.
SENDIRA: Infrared spectroscopic ellipsometry
Vibrational spectroscopy is featured by the FTIR ellipsometer SENDIRA. Measuring the absorption bands of molecular vibrational modes in the infrared, the orientation of long molecule chains and the composition of thin films are analysed. Infrared spectroscopic ellipsometry is suited for measuring charge carrier concentration of conducting films.
SENDURO: Automated spectroscopic ellipsometry
Automated spectroscopic ellipsometry by SENDURO® comprises recipe based quick data analysis within a few seconds. The ellipsometer is designed for easy operation: Placing the sample, automatic sample alignment, automated measurement and analysis, result. Using spectroscopic ellipsometry in the automatic mode is perfectly suited for routine applications in quality control and R&D.
SpectraRay/3: Spectroscopic ellipsometry software
The spectroscopic ellipsometry software SpectraRay/3 is designed focusing on an intuitive workflow. Therefore, SpectraRay/3 comprises a recipe mode with a two-step action (start measurement, result) and an interactive mode for step-by-step data analysis. The comprehensive package of SpectraRay/3 supports generalized ellipsometry, Mueller Matrix formalism, scatterometry (3D profiler), anisotropy, and simulations.
Laser Ellipsometer SE 400adv
The laser ellipsometer SE 400adv measures thickness and refractive index of transparent thin films, featuring measurement speed, Sub-Angstrom precision in thickness, and per mille accuracy in refractive index determination. Multiple angle measurements allow the characterization of absorbing films using the laser ellipsometer SE 400adv.
CER Ellipsometer SE 500adv
The CER ellipsometer SE 500adv combines a laser ellipsometer and a reflectometer in one system. This combination allows zero degree reflectometry for fast thin film analysis and the unambiguous thickness determination for transparent films extending the measurable thickness range to 25 µm with the Sub-Angstrom precision of a laser ellipsometer.
In situ Laser Ellipsometer SE 401
The in situ laser ellipsometer SE 401 is designed for monitoring in situ deposition and etch processes and to measure thickness and refractive index of layers under vacuum.