Thin Film Deposition

Omicron installation at Waterloo Australia

Scitek provides a wide range of Thin Film Deposition products used to built or optimize product design across a wide array of applications. Applications range from an increased production rate of silicon chips to increased adhesion strength and reproducibility, making it ideal for research labs and large quantity manufacturing environments.


ALD (Cambridge Nanotech / Ultratech)

Savannah
The Savannah series of thin film deposition systems has become the standard for ALD research and development. Savannah combines ease of use and great experimental flexibility into a compact, inexpensive package. Savannah series is ideal if you are looking for an affordable, reliable ALD system.

Fiji
The Fiji series is ideal when the needs for thin film deposition systems are more advanced and require broader experimental flexibility.

The Fiji is modular and can be customized to meet a wide range of ALD applications. For example, the Fiji systems come with a plasma generator to enable plasma-enhanced ALD. In addition, with either single or double chamber design, Fiji can be configured for cleanroom compatibility and comes with an optional loadlock.

Phoenix
The Phoenix is engineered for high throughput and maximum uptime in any fabrication environment, from pilot production to industrial-grade manufacturing. Technologists and researchers rely on the Phoenix for repeatable, highly accurate film deposition on flat and 3D substrates alike. And with support for up to six individual precursor lines, the Phoenix delivers solid, liquid, or gaseous process chemistries depending on your thin film needs. A compact footprint and innovative design, plus numerous automation options, makes Phoenix the practical choice for those with batch production ALD requirements.


PVD (Angstrom)

COVAP – A compact, economical solution suitable for many process applications, the small size of the Covap II will ensure you can find space in your lab and in your budget.  Approximate substrate maximum: 75mm x 75mm.

NEXDEP – Incredible versatility with a compact footprint.  Myriad process applications and tools available, while remaining within budget.  It’s the perfect system for smaller substrates involved in the most advanced, recipe driven work.  Approximate substrate maximum: 100mm x 100mm.

EVOVAC
The most capable PVD platform providing the largest chamber for multiple deposition sources, and the most modifiable process tools to ensure your specific research needs are being met precisely.  It’s the perfect tool for complex recipes that demand multiple sources and advanced deposition techniques.  Approximate substrate maximum: 150mm x 150mm.

 


MBE (Omicron Scienta)

EVO-25/50The EVO-25/50  MBE-Systems are dedicated growth systems with a loadlock chamber  and with an optional preparation/storage chamber. The substrate sizes are either 1” (EVO-25) or 2” (EVO-50). The systems of course also accept the Omicron standard sample plates.

The carefully designed chamber with up to 10 effusion cells shows excellent thickness uniformity for all substrate sizes. The large effusion cell capacity of to 80 cm3 for layer growth increases the up-time of the system significantly.

The fast & reliable sample transfer together with the excellent performance results in a low cost of ownership. The optional available easy & intuitive to operate growth control software and the possibility to add standard Omicron analysis equipment makes this a unique MBE system for researchers.

LAB-10The LAB-10 MBE System is the standard MBE system with a loadlock chamber  and with an optional preparation/storage chamber. The substrate size for the LAB-10 MBE system is the Omicron standard sample plate.

Its proven chamber design with up to 7 effusion cells is revealed in an excellent thickness homogeneity for a 10 mm substrate. The effusion cell capacity can range from 10 cm3 up to 35 cm3 for layer growth.

The  fast & reliable sample transfer together with the excellent performance results in a low cost of ownership. The optional available easy & intuitive to operate growth control software and the possibility to add standard Omicron analysis equipment makes this a unique MBE system for researchers.

PRO-75/100 The PRO-75/100  MBE-Systems are dedicated growth systems with a loadlock chamber  and with an optional preparation/storage chamber. The substrate sizes are either 3” (PRO-75) or 4” (PRO-100). The systems of course also accept smaller samples (1” and 2”) and the Omicron standard sample plates.

The carefully designed chamber with up to 12 effusion cells shows excellent thickness uniformity for all substrate sizes. The large effusion cell capacity of to 130 cm3 for layer growth increases the up-time of the system significantly.
The fast & reliable sample transfer together with the excellent performance results in a low cost of ownership. The optional available easy & intuitive to operate growth control software and the possibility to add standard Omicron analysis equipment makes this a unique MBE system for researchers.


PECVD(Sentech)

ICP Plasma Deposition System SI500DThe high end ICPECVD system SI 500 D provides exceptional performance for plasma based deposition processes. High quality dielectric and Si films are deposited using high density PECVD generated with the PTSA ICP plasma source. The planar triple spiral antenna (PTSA) ensures excellent properties of the deposited films, such as low etching rates, low stress and low interface state density at very low deposition temperatures (≤ 100 °C)

PECVD Loadlock System SI500PPDThe flexible PECVD system SI 500 PPD features a variety of standard plasma deposition processes. SiO2, SiNx, SiOxNy, and a-Si are deposited with capacitively coupled plasma. The flexible design allows to use gaseous or liquid precursors for PECVD like TEOS.

PECVD Direct Loading System Depolab_openThe PECVD system Depolab 200 combines cost effective direct loading and parallel plate plasma source in a basic, compact design. The easy to use direct loading system enables user-friendly batch processing (with carrier or direct loading onto the substrate electrode). The clever PECVD system can be upgraded for enhanced performance on demand.

For further enquires please contact us on contact@scitek.com.au or on our contact page.