Plasma Characterisation

Plasma Measurementation

Substrate Ion Interactions
– Interactions of ions at a substrate play a major role in plasma processing. The ability to quantify the flux and energy of ions impacting a surface is crucial for optimising process conditions.

Semion Single Sensor
The Semion Single Sensor is placed at any location inside a plasma reactor and measures the energy of ions hitting a surface using a single measurement sensor.
Plasma Parameters Measured:
Ion Energy • Ion Flux • Negative Ions • Temperature • Bias Voltage (Vdc)

Semion Multi Sensor

Semion Multi Sensor
The Semion Multi-Sensor measures the uniformity of ion energies hitting a surface using a number of plasma measurement sensors.
Plasma Parameters Measured:
Ion Energy Uniformity • Ion Flux Uniformity • Negative Ion Uniformity • Temperature Uniformity • Bias Voltage

Vertex Single Sensor
The Vertex Single Sensor is placed at any location inside a plasma reactor and measures the ion angular distribution hitting a surface using a single sensor.
Plasma Parameters Measured:
Ion Angle • Ion Energy • Ion Flux • Negative Ions • Temperature • Voltage Direct Current


Vertex Multi Sensor

The Vertex Multi-Sensor measures the angle of ions hitting a surface inside a plasma reactor from multiple locations to analyse ion angle uniformity.
Plasma Parameters Measured:
Ion Angle Uniformity • Ion Energy Uniformity • Ion Flux Uniformity • Negative Ion Uniformity • Temperature Uniformity • Voltage Direct Current


Substrate Ion Neutral Deposition
– In deposition systems, measurement of the ion-neutral ratio, deposition rate and ion interactions enables rapid process development.

Quantum Single Sensor
The Quantum is a unique instrument to measure the ratio of ions to neutrals hitting a surface inside a plasma reactor.
Plasma Parameters Measured:
Ion Neutral Fraction • Deposition Rate • Ion Energy • Ion Flux • Bias Voltage


Quantum Multi Sensor

The Quantum is a unique instrument to measure the ratio of ions to neutrals hitting a surface inside a plasma reactor.
Plasma Parameters Measured:
Ion Neutral Fraction • Deposition Rate • Ion Energy • Ion Flux • Bias Voltage


Substrate Ion Species Mass

Species Single Sensor
The Species Single Sensor sits at any location inside a plasma reactor and measures the individual species (mass) of ions hitting a surface using a miniaturised single sensor.
Plasma Parameters Measured:
Ion Mass • Ion Energy • Ion Flux • Negative Ions • Temperature • Voltage Direct Current
Species Multi Sensor
Species Multi Sensor
The Species Multi-Sensor measures the uniformity of ion species (mass) hitting a surface using an array of miniaturised sensors.
Plasma Parameters Measured:
Ion Mass Uniformity • Ion Energy Uniformity • Ion Flux Uniformity • Negative Ion Uniformity • Temperature Uniformity • Voltage Direct Current


Bulk Plasma Parameters
– The parameters that make up the bulk of the plasma such as plasma potential, plasma density, ion density, electron energy & electron temperature can be measured to give a greater understanding.
Langmuir Probe
Langmuir Probe
The Langmuir Probe is one of the most common and widely used plasma diagnostics and measures parameters in the bulk of the plasma.
Plasma Parameters Measured:
Floating Potential • Plasma Potential • Plasma Density • Ion Current Density • Electron Energy Distribution Function • Electron Temperature
Langmuir Spatial Probe
Langmuir Spatial Probe
The Langmuir Spatial Probe uses an automated linear drive to scan across a plasma and take measurements of plasma parameters at different locations.
Plasma Parameters Measured:
Floating Potential Uniformity • Plasma Potential Uniformity • Plasma Density Uniformity • Ion Current Density Uniformity • Electron Energy Distribution Function

Plato Probe
The Plato Probe is a planar Langmuir Probe designed to work in deposition plasmas when an insulating film is deposited on the probe surface.
Plasma Parameters Measured:
Plasma Density • Ion Current Density • Electron Temperature

Plato Spatial Probe
The Plato Spatial Probe scans across the bulk of a plasma and measures the parameters at different locations even when depositing an insulating layer up to 100 microns thick on the probe surface.
Plasma Parameters Measured:
Plasma Density Uniformity • Ion Current Density Uniformity • Electron Temperature Uniformity

 

Bdot Probe
The Bdot Probe measures the rate of change in the magnetic flux over time in the bulk of the plasma.
Parameters Measured:
B-Dot

Bdot Spatial Probe
The Bdot Spatial Probe includes an automated linear drive and scans across a plasma to measure the rate of change in the magnetic flux over time.
Parameters Measured:
B-dot


Atmospheric Plasma Parameters
– Plasmas used in applications at high pressures have become more prevalent in recent years. The ability to measure and understand the plasma parameters give great insight into the processes.
Atmospherix Probe
Atmospherix Probe
The Langmuir Atmospherix Probe measures the key plasma parameters and is designed to work up to atmospheric pressure plasmas e.g. plasma flame and plasma jet.
Plasma Parameters Measured:
Electron Temperature • Ion Flux • Ion Density • Debye LengthAtmospherix Thermal Probe

Atomspherix Thermal Probe
The Atmospherix Thermal Probe measures the key plasma parameters and works in atmospheric pressure and high temperature plasma environments e.g. plasma torch.
Plasma Parameters Measured:
Electron Temperature • Ion Flux • Ion Density • Debye Length


Power Delivery Plasma Measurement
Slight changes in power as a plasma input parameter affects the quality of a substrate. Monitoring the voltage, current and phase, harmonic information can be extracted giving better process stability.

Octiv Mono
The Octiv Mono is an in-line RF power measurement system. It measures a single fundamental frequency and has an accuracy rating of 1% and a time resolution of 1 micro second. Each system has a drop down menu with a choice of 5 fundamental frequencies to choose from.
RF Parameters Measured:
Real Power (1μs Time Resolution) • Forward Power (1μs Time Resolution) • Reflected Power (1μs Time Resolution) • Impedance (1μs Time Resolution)

Octiv VI
The Octiv VI is an in-line RF voltage, current and phase measurement system. It can measure a single fundamental frequencies and its harmonics at 1% accuracy and 1 micro second time resolution. Each system has a drop down menu with a choice of 5 fundamental frequencies to choose from.
RF Parameters Measured:
Voltage (1μs Time Resolution) • Current (1μs Time Resolution) • Phase (1μs Time Resolution) • Impedance (1μs Time Resolution) • Harmonics (1μs Time Resolution)

Octiv Poly
The Octiv Poly is an in-line RF voltage, current and phase measurement system. It can measure a total of 5 fundamental frequencies simultaneously and harmonics with frequency agility at 1% accuracy and 1μs time resolution.
RF Parameters Measured:
Voltage (1μs Time Resolution) • Current (1μs Time Resolution) • Phase (1μs Time Resolution) • Impedance (1μs Time Resolution) • Harmonics (1μs Time Resolution)

Octiv Suite
The Octiv Suite is an in-line RF voltage, current and phase measurement system. It can measure a total of 5 fundamental frequencies simultaneously and harmonics with frequency agility at 1% accuracy and 1 micro second time resolution. It can reconstruct the RF wave-form from complex frequency spectra simultaneously and in plasma applications measure ion flux at the substrate position
RF Parameters Measured:
Voltage (1μs Time Resolution) • Current (1μs Time Resolution) • Phase (1μs Time Resolution) • Impedance (1μs Time Resolution) • Harmonics (1μs Time Resolution) • Ion Flux

Instrument Catalogue – Link

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