Multi Technique Electron Beam Lithograph The Multi Technique Electron Beam Lithography systems combine the required flexibility of open platform instruments with the performance expected from nanolithography systems. Scitek Australia provides the following Multi Technique Electron Beam Lithography’s: eLINE Plus The … Continue reading →

Dedicated Reverse Engineering Reverse engineering is a sophisticated process used in the protection of intellectual property (IP) and chip and IC design recovery. CHIPSCANNER is based on Raith’s lithography technologies and delivers unrivalled accuracy and stability required for large area … Continue reading →

Focused Ion Beam Nanofabrication FIB complements the overall nanofabrication process by providing various direct patterning or masking techniques. Direct milling, deposition, or etching helps to simplify the nanofabrication process and minimize process development efforts. resistless hard masking, ion implantation, and … Continue reading →

Dedicated Electron Beam Lithography Dedicated Electron Beam Lithography systems fulfill the automation and throughput requirements of industrial clients and centers of excellence offering nano-lithography services. Products provided by Scitek Australia as listed described below: EBPG5200 The EBPG5200 is a high … Continue reading →